"The Plasma" which is a fourth matter state becomes the indispensable technique in advanced electronic industry. "Plasma" performs
the super minute processing with nanometer size which can make Large scale integrated circuit (LSI) mounted in information electric products such as mobile phone
and computer. In our laboratory, we are performing a study on development of a plasma processing apparatus with low-energy consumption based on environmental conservation supporting those techniques and/or electronic material functional film preparation using the plasma.
The manuscript with international collaborative research submitted by Prof. Ohtsu has been published in Vacuum as Article in press.new!!